Carbon black surface characterization by TOF-SIMS and XPS

Citation
P. Bertrand et Lt. Weng, Carbon black surface characterization by TOF-SIMS and XPS, RUBBER CHEM, 72(2), 1999, pp. 384-397
Citations number
24
Categorie Soggetti
Organic Chemistry/Polymer Science","Material Science & Engineering
Journal title
RUBBER CHEMISTRY AND TECHNOLOGY
ISSN journal
00359475 → ACNP
Volume
72
Issue
2
Year of publication
1999
Pages
384 - 397
Database
ISI
SICI code
0035-9475(199905/06)72:2<384:CBSCBT>2.0.ZU;2-A
Abstract
The functional groups present at the carbon black (CB) surface contribute, along with the surface microstructure, to the CB surface activity which is known to be an important parameter for the rubber reinforcing properties. A direct detection of the foreign elements (H, N, O, S, Cl,...) present at t he CB surface can be achieved with surface analytical techniques such as ri me-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) and X-ray Photoelec tron Spectoscopy (XPS). The combination of these two techniques is found to be very fruitful. Indeed. although the TOF-SIMS sensitivity is much higher than for XPS, allowing trace detection, this technique suffers from a lack of quantification which can be fulfilled by XPS. The chemical information on the functional groups obtained by both methods is complementary In XPS, this information is deduced from the electron core level chemical shifts which are mainly influenced by the first neighboring atoms; whereas, in TOF-SIMS, the full molecular environment can be detecte d. Not only information on the surface groups, but also some structural inf ormation can be obtained. Indeed, the TOF-SIMS spectra of carbon black exhi bit molecular ions which are characteristic of the surface aromaticity (gra phene structure) and also specific clusters at high masses which seem to be related to the basic building block of carbon black particles.