In this paper we present the investigation of properties of silicon carbide
power rectifiers, in particular Schottky, PiN and advanced hybrid power re
ctifiers such as the trench MOS barrier Schottky rectifier. Analysis of the
forward, reverse and switching experimental characteristics are presented
and these silicon carbide rectifiers are compared to silicon devices. Silic
on carbide Schottky rectifiers are attractive for applications requiring bl
ocking voltage in excess of 100 V as the use of Si is precluded by its larg
e specific on-resistance. Analysis of power dissipation indicates that sili
con carbide Schottky rectifiers offer significant improvement over silicon
counterparts. Silicon carbide junction rectifiers, on the other hand, are s
uperior to silicon counterparts only for blocking voltage greater than 2000
V.
Performance of acceptor (boron) and donor (phosphorus) implanted experiment
al silicon carbide junction rectifiers are presented and compared. Some of
the recent developments in silicon carbide rectifiers have been described a
nd compared with theory and our experimental results. The well established
silicon rectifiers theory are often inadequate to describe the characterist
ics of the experimental silicon carbide junction rectifiers and appropriate
generalization of these theories are presented. Experimental trench MOS ba
rrier Schottky rectifiers (TMBS) have demonstrated significant improvement
in leakage current compared to planar Schottky devices. Performance of curr
ent state-of-the-art silicon carbide rectifiers are far from theoretical pr
edictions. Availability of high-quality silicon carbide crystals is crucial
to successful realization of these performance projections. (C) 1999 Elsev
ier Science Ltd. All rights reserved.