Realization of high tunability barium strontium titanate thin films by rf magnetron sputtering

Citation
P. Padmini et al., Realization of high tunability barium strontium titanate thin films by rf magnetron sputtering, APPL PHYS L, 75(20), 1999, pp. 3186-3188
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
20
Year of publication
1999
Pages
3186 - 3188
Database
ISI
SICI code
0003-6951(19991115)75:20<3186:ROHTBS>2.0.ZU;2-5
Abstract
Ferroelectric thin films are currently being used to develop tunable microw ave circuits based on the electric-field dependence of the dielectric const ant. (Ba0.5Sr0.5)TiO3 (BST) films prepared by sputtering on Pt/TiO2/SiO2/Si substrates are found to exhibit a capacitance change (tunability) of nearl y 4:1. Higher tunability has been attributed to the (100) texturing of the BST films and is a result of the biaxial tensile stress imposed by Si on BS T making the polar axis oriented in plane. Electrical characterization show s that the dielectric permittivity increases with increase in film thicknes s (up to similar to 200 nm). (C) 1999 American Institute of Physics. [S0003 -6951(99)03646-3].