Effective scaling behavior of magnetization and Hamming distance in Ising thin films under a surface field

Citation
Emd. Luz et al., Effective scaling behavior of magnetization and Hamming distance in Ising thin films under a surface field, EUR PHY J B, 12(1), 1999, pp. 115-118
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
EUROPEAN PHYSICAL JOURNAL B
ISSN journal
14346028 → ACNP
Volume
12
Issue
1
Year of publication
1999
Pages
115 - 118
Database
ISI
SICI code
1434-6028(199911)12:1<115:ESBOMA>2.0.ZU;2-M
Abstract
The recent improvements on the technology for developing high-quality thin magnetic films has renewed the interest in the study of surface effects in both static and dynamic magnetic responses. In this work, we use a Monte-Ca rlo algorithm with Metropolis dynamics together with a spreading of damage technique to study the interplay between the effects of finite thickness an d surface ordering field in thin ferromagnetic Ising (S = 1/2) films. We ca lculate, near the bulk critical temperature and several values of the surfa ce field, the dependence on the film thickness of the average magnetization M and Hamming distance D. We employ a finite size scaling analysis to show that both obey an effective one-parameter scaling but exhibit distinct cha racteristic surface fields. At their corresponding characteristic surface f ields both M and D become roughly thickness independent and we estimate the critical exponent characterizing the behavior of the typical scaling lengt hs.