Emd. Luz et al., Effective scaling behavior of magnetization and Hamming distance in Ising thin films under a surface field, EUR PHY J B, 12(1), 1999, pp. 115-118
The recent improvements on the technology for developing high-quality thin
magnetic films has renewed the interest in the study of surface effects in
both static and dynamic magnetic responses. In this work, we use a Monte-Ca
rlo algorithm with Metropolis dynamics together with a spreading of damage
technique to study the interplay between the effects of finite thickness an
d surface ordering field in thin ferromagnetic Ising (S = 1/2) films. We ca
lculate, near the bulk critical temperature and several values of the surfa
ce field, the dependence on the film thickness of the average magnetization
M and Hamming distance D. We employ a finite size scaling analysis to show
that both obey an effective one-parameter scaling but exhibit distinct cha
racteristic surface fields. At their corresponding characteristic surface f
ields both M and D become roughly thickness independent and we estimate the
critical exponent characterizing the behavior of the typical scaling lengt
hs.