The effect of electromagnetic retardation on the rupture process of a verythin liquid film

Citation
Cc. Hwang et al., The effect of electromagnetic retardation on the rupture process of a verythin liquid film, J COLL I SC, 219(2), 1999, pp. 357-359
Citations number
17
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF COLLOID AND INTERFACE SCIENCE
ISSN journal
00219797 → ACNP
Volume
219
Issue
2
Year of publication
1999
Pages
357 - 359
Database
ISI
SICI code
0021-9797(19991115)219:2<357:TEOERO>2.0.ZU;2-X
Abstract
Effects of electromagnetic retardation on the rupture process of a very thi n liquid film coated on a flat plate are studied. The analysis results indi cate that the electromagnetic retardation effect (D) for the case A > 0 (at traction) is a stabilization factor, which prolongs the rupture time. The w avenumber of the most unstable mode is decreasing as D increases. It is als o found that the linear solution of rupture time T-LM is larger than the no nlinear rupture time T-NM, but the gradient of T-LM to D is comparable to t hat of TNM. (C) 1999 Academic Press.