Bd. Fulthorpe et al., The progression of interface structure through sputtered Co/Cu and Co/Pt multilayer films, J PHYS-COND, 11(43), 1999, pp. 8477-8487
The progression of interface structure through some Co/Cu and ColPt multila
yer systems, grown on silicon and glass substrates respectively, has been s
tudied using grazing incidence x-ray scattering. Simulations of the data sh
ows that the interface characteristics of the Co/Cu system propagate unchan
ged with increasing numbers of bilayers. The interface roughness, lateral l
ength scale and fractal dimension remain constant across the series of samp
les. In contrast, a reduction in the interface conformality between top and
bottom surfaces with respect to increasing numbers of bilayers is observed
in the Co/Pt system; however the roughness correlation between successive
layers is largely maintained. Magnetization data for Co/Cu indicate that th
e Co layer immediately adjacent to the substrate is magnetically 'dead'. Th
is could result from mixing of the cobalt and silicon oxide species at the
substrate interface.