A new photobase generator containing oxime-urethane group and its application

Authors
Citation
Kh. Chae et Dj. Jang, A new photobase generator containing oxime-urethane group and its application, MACRO SYMP, 142, 1999, pp. 173-183
Citations number
18
Categorie Soggetti
Organic Chemistry/Polymer Science
Journal title
MACROMOLECULAR SYMPOSIA
ISSN journal
10221360 → ACNP
Volume
142
Year of publication
1999
Pages
173 - 183
Database
ISI
SICI code
1022-1360(199908)142:<173:ANPGCO>2.0.ZU;2-1
Abstract
Photochemical base formation from oxime-urethane derivatives was observed v ia pH changes, GC and HPLC analysis, and laser flash photolysis study. Phot olysis of these derivatives results in the formation of amines which induce cross-linking of poly(glycidyl methacrylate) (PGMA) upon heating. Photocro ss-linking reaction of the copolymers, containing epoxy and oxime-urethane groups, were studied by measuring the insoluble fraction of copolymer films under various reaction conditions. Thermal cross-linking reaction of the c opolymer was catalysed by the photogenerated pendant amines. The copolymer containing oxime-urethane groups which photogenerate aromatic amines can be utilized as an image recording material.