Preparation and pressure-induced semiconductor-metal transition of CrSi2 nanocrystals

Citation
Js. Lu et al., Preparation and pressure-induced semiconductor-metal transition of CrSi2 nanocrystals, MATER LETT, 41(3), 1999, pp. 97-100
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS LETTERS
ISSN journal
0167577X → ACNP
Volume
41
Issue
3
Year of publication
1999
Pages
97 - 100
Database
ISI
SICI code
0167-577X(199911)41:3<97:PAPSTO>2.0.ZU;2-J
Abstract
Semiconducting chromium disilicide (CrSi2) nanocrystals were prepared by th e are plasma method, and characterized by X-ray diffraction and transmissio n electron microscopy. The pressure-induced semiconductor-metal transition in CrSi2 nanocrystals was investigated in a diamond anvil cell by electrica l resistance measurements at high pressure. The pressure dependence of resi stance at room temperature in the pressure range of 0-10 GPa revealed an ex ponential decrease up to 3.2 GPa, indicating a linear closing of the energy gap, followed by an almost pressure-independent metallic regime. This phas e transition is discussed in terms of previous band structure calculations. (C) 1999 Elsevier Science B.V. All rights reserved.