Electron-beam PVD Cr and Ti films on C/C-SiC substrates

Cr and Ti films on C/C-SiC (infiltrated) and C/C-SiC coated by chemical dep osition substrates were obtained by electron beam physical vapour depositio n. The morphology and properties of the films were studied by using optical microscopy, scanning electron microscopy and X-ray diffraction methods. Sc anning electron micrographs show small, uniform grain size, which indicates good quality coating. The X-ray investigations show that the residual stre sses may vary within a wide range, depending on the type of substrate and f ilm thickness. The cracks in SiC were completely covered by 50-mu m thick C r and Ti coatings. (C) 1999 Published by Elsevier Science S.A. All rights r eserved.