Tin oxide growth in nanoporous silicon: an approach to an efficient solid state electrode

Citation
Ja. Roger et al., Tin oxide growth in nanoporous silicon: an approach to an efficient solid state electrode, SEMIC SCI T, 14(11), 1999, pp. L29-L32
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
ISSN journal
02681242 → ACNP
Volume
14
Issue
11
Year of publication
1999
Pages
L29 - L32
Database
ISI
SICI code
0268-1242(199911)14:11<L29:TOGINS>2.0.ZU;2-7
Abstract
In this preliminary work, we show the ability of the Sol-Gel technique to i ntroduce a solid phase into the nanopores of porous silicon. From RBS-C ana lysis, a complete incorporation of both tin and oxygen atoms over most of t he porous layer thickness has been evidenced. TEM observations revealed the presence of small crystallites of cassiterite embedded in the porous layer . Providing that the silicon porosity does not exceed 70%, this solid phase does not degrade the skeleton of porous silicon and does not inhibit photo luminescence.