Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon (vol 14, pg 936, 1999)

Authors
Gogotsi, Y Baek, C Kirscht, F
Citation
Y. Gogotsi et al., Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon (vol 14, pg 936, 1999), SEMIC SCI T, 14(11), 1999, pp. 1019-1019
Citations number
1
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
ISSN journal
02681242 → ACNP
Volume
14
Issue
11
Year of publication
1999
Pages
1019 - 1019
Database
ISI
SICI code
0268-1242(199911)14:11<1019:RMSOPP>2.0.ZU;2-S