Deep levels in GaN epilayers grown on sapphire substrates

Citation
Tw. Kang et al., Deep levels in GaN epilayers grown on sapphire substrates, SOL ST COMM, 112(11), 1999, pp. 637-642
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SOLID STATE COMMUNICATIONS
ISSN journal
00381098 → ACNP
Volume
112
Issue
11
Year of publication
1999
Pages
637 - 642
Database
ISI
SICI code
0038-1098(1999)112:11<637:DLIGEG>2.0.ZU;2-R
Abstract
Steady state and transient extrinsic photoconductivity (PC) measurements on unintentionally doped GaN epilayers grown on sapphire substrates by using metalorganic chemical vapor deposition were performed to investigate deep e lectron levels. The photoionization cross section and the concentration of the deep levels were determined from the dependence of the rise and the dec ay times of the extrinsic PC response on the illumination intensity. The co ncentrations on the deep levels, located at 2.9 and 1.42 eV below the condu ction band minimum of the GaN were found to be 2 x 10(13) and 1.6 X 10(11) cm(-3), respectively. The typical relaxation time of the excess carriers co ntrolled by the deep levels was approximately 10(-3) s. The thermal activat ion energies of the deep levels were determined from the temperature depend ence of the relaxation time of the extrinsic PC response. These results can help improve understanding for potential applications in optoelectronic de vices based on GaN epilayers. (C) 1999 Published by Elsevier Science Ltd. A ll rights reserved.