Characterisation of magnetron sputter deposited MoSx/metal multilayers

Pure MoSx as well as MoSx/Pb and MoSx/Ti nanometer-scale multilayers with i ndividual layer thickness in the 4-100 nm range, were prepared by magnetron sputtering at room temperature. The effects of changing the number of inte rfaces and the effects of changing the percentage of metal (i.e. metal laye r thickness) on film microstructure and chemistry have been investigated us ing SMMS (sputtered neutral mass spectroscopy) depth profiling and X-ray te chniques. SNMS depth profiling and X-ray reflection indicate that MoSx/Ti m ultilayers have a well-defined multilayer structure with sharp interfaces. MoSx/Pb multilayers on the other hand have a poorly defined multilayer stru cture with broad, diffuse interfaces. There is also evidence that Ti, and t o a lesser extent Pb, getter residual oxygen in the vacuum chamber leading to lower oxygen levels within the MoSx layers. X-ray diffraction indicates that the degree of basal (002) orientation is strongly influenced by the nu mber of interfaces in the him as well as by the choice of the metal. The (1 10) oriented planes are strongly influenced by the MoSx layer thickness, bu t are relatively insensitive to the metal layer thickness and metal type. X -ray rocking curves indicate that the degree to which the edge-oriented pla nes have mosaic structure is dependent on MoSx layer thickness, and that th is may well be linked to improved tribological performance. (C) 1999 Elsevi er Science S.A. All sights reserved.