Plasma processing of thin films of high temperature superconductors: Deposition methods and growth aspects

Remarkable advances have been made in recent years in science and technolog y of thin film processes for deposition of high temperature superconductors . In this report, various deposition techniques have been reviewed from a p rocess view point. Fundamental aspects of DC glow discharges and sputtering techniques based on plasma process are outlined. Emphasis is placed on the plasma assisted technique such as glow discharge deposition. The issues re lating to the formation of superconducting thin films of YBa2Cu3O7-x on Var iety of single crystal substrates are also briefly described.