Vs. Raghunathan et P. Kuppusami, Plasma processing of thin films of high temperature superconductors: Deposition methods and growth aspects, T I INST ME, 52(4), 1999, pp. 251-278
Remarkable advances have been made in recent years in science and technolog
y of thin film processes for deposition of high temperature superconductors
. In this report, various deposition techniques have been reviewed from a p
rocess view point. Fundamental aspects of DC glow discharges and sputtering
techniques based on plasma process are outlined. Emphasis is placed on the
plasma assisted technique such as glow discharge deposition. The issues re
lating to the formation of superconducting thin films of YBa2Cu3O7-x on Var
iety of single crystal substrates are also briefly described.