Aluminum nitriding by ECR nitrogen plasma

Authors
Duez, N Mutel, B Grimblot, J Dessaux, O Goudmand, P
Citation
N. Duez et al., Aluminum nitriding by ECR nitrogen plasma, CR AC S IIB, 327(11), 1999, pp. 1191-1196
Citations number
11
Categorie Soggetti
Multidisciplinary
Journal title
COMPTES RENDUS DE L ACADEMIE DES SCIENCES SERIE II FASCICULE B-MECANIQUE PHYSIQUE ASTRONOMIE
ISSN journal
12874620 → ACNP
Volume
327
Issue
11
Year of publication
1999
Pages
1191 - 1196
Database
ISI
SICI code
1287-4620(199910)327:11<1191:ANBENP>2.0.ZU;2-5
Abstract
Distributed Electron Cyclotron Resonance (DECR) nitrogen plasma was used to nitride aluminum surfaces, without polarisation or external heating. Befor e nitriding, the alumina layer was etched in-situ by DECR argon or argon hydrogen plasma. X-ray photoelectron spectroscopy (XPS) analyses showed tha t the surface AIN layer corresponds to 60 % of the total aluminum detected. (C) 1999 Academie des sciences/Editions scientifiques et medicales Elsevie r SAS.