Wetting of SiO2 surfaces by phospholipid dispersions

Citation
Lc. Salay et Am. Carmona-ribeiro, Wetting of SiO2 surfaces by phospholipid dispersions, J ADHES SCI, 13(10), 1999, pp. 1165-1179
Citations number
29
Categorie Soggetti
Material Science & Engineering
Journal title
JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY
ISSN journal
01694243 → ACNP
Volume
13
Issue
10
Year of publication
1999
Pages
1165 - 1179
Database
ISI
SICI code
0169-4243(1999)13:10<1165:WOSSBP>2.0.ZU;2-5
Abstract
Wetting of SiO2/Si/SiO2 slides by phospholipid dispersions has been determi ned over a range of phospholipid concentrations and times of interaction be tween vesicles and the solid surface. Both advancing and receding dynamic c ontact angles (theta) increased and the contact angle hysteresis decreased as a function of the phospholipid concentration (or interaction time), atta ining a maximum (a minimum). Maximization of both the advancing and recedin g contact angles and minimization of the contact angle hysteresis are assoc iated with an increase in the chemical homogeneity of the surface and one-b ilayer deposition. Determination of contact angles is a powerful, quick, an d simple technique to establish experimental conditions for bilayer deposit ion on solid surfaces in general. This result may be of importance for furt her advancements in rapidly developing research areas such as the design of biosensors, immunodiagnosis, and the development of biocompatible material s.