Characterization of GaAs/AlGaAs heterojunction bipolar transistor devices using photoreflectance and photoluminescence

Citation
Ac. Han et al., Characterization of GaAs/AlGaAs heterojunction bipolar transistor devices using photoreflectance and photoluminescence, J APPL PHYS, 86(11), 1999, pp. 6160-6163
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
86
Issue
11
Year of publication
1999
Pages
6160 - 6163
Database
ISI
SICI code
0021-8979(199912)86:11<6160:COGHBT>2.0.ZU;2-B
Abstract
Photoreflectance (PR) and photoluminescence (PL) techniques were used to ch aracterize the AlGaAs/GaAs heterojunction bipolar transistor (HBT) wafers g rown by molecular beam epitaxy (MBE). The line shape of the PR GaAs signal is closely related to the cleanliness of the MBE system. The Franz-Keldysh oscillations of the GaAs signal become sharper, well defined, and the oscil lation amplitude increases slightly as the MBE system is cleaned up. The dc current gain of the HBT devices was observed to increase accordingly. The origin for this correlation is discussed. The PL spectra of the HBT device wafers indicate that the intensity of the free-to-bound transition correspo nding to the donor to valence band becomes strong in high gain device wafer s. (C) 1999 American Institute of Physics. [S0021-8979(99)05723-0].