High-quality off-stoichiometric YBa2Cu3O7-delta films produced by diffusion-assisted preferential laser ablation

Citation
Jm. Huijbregtse et al., High-quality off-stoichiometric YBa2Cu3O7-delta films produced by diffusion-assisted preferential laser ablation, J APPL PHYS, 86(11), 1999, pp. 6528-6537
Citations number
38
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
86
Issue
11
Year of publication
1999
Pages
6528 - 6537
Database
ISI
SICI code
0021-8979(199912)86:11<6528:HOYFPB>2.0.ZU;2-Y
Abstract
The fluence dependence of the composition of pulsed-laser deposited YBa2Cu3 O7-delta films is investigated and interpreted in terms of laser-induced ta rget modification. Both target degradation (at fluence J < 1.0 J/cm(2)) and diffusion-assisted preferential ablation (1.0 < J < 1.3 J/cm(2)) are found to be responsible for nonstoichiometric transfer. A one-dimensional, movin g-boundary diffusion model is developed to describe diffusion-assisted pref erential ablation. This model predicts stoichiometric transfer at large abl ation rates. Indeed, for J much greater than 1.3 J/cm(2) stoichiometric dep osition is found, resulting in precipitate-free films. However, slightly of f-stoichiometric films, deposited in the diffusion-assisted preferential ab lation regime, exhibit the best superconducting properties (T-c = 91.0 K, D elta T-c = 0.4 K) and can be produced with a remarkably high reproducibilit y. (C) 1999 American Institute of Physics. [S0021-8979(99)08523-0].