J. Khachan et D. Gardner, The effect of frequency and duty cycle of a pulsed microwave plasma on thechemical vapor deposition of diamond, J APPL PHYS, 86(11), 1999, pp. 6576-6579
We examine the effect of a pulsed microwave discharge on the deposition rat
e of polycrystalline diamond by varying the pulse repetition rate and duty
cycle. A simple model of the dynamic plasma chemistry is developed in order
to explain the increase in growth rate with frequency for the same average
power. Changing the duty cycle while keeping the total plasma on-time cons
tant resulted in the same film thickness for all duty cycles. One possible
implication of this is that growth takes place when the pulse is on. (C) 19
99 American Institute of Physics. [S0021-8979(99)00920-2].