Js. Cross et al., Microstructure and electrical properties of chemical solution deposition (Pb,La)(Zr,Ti)O-3 thin films on Pt electrodes, J MATER RES, 14(11), 1999, pp. 4366-4371
(Pb,La)(Zr,Ti)O-3 (PLZT) films with thicknesses of 150 and 225 nm were prep
ared by the chemical solution deposition method on sputtered Pt/IrO2 coated
on SiO2/Si wafers. The annealed films revealed two different microstructur
es: fined-grained and large-grained The thinner film had the largest grain
size and highest leakage current, whereas the thicker film had small grains
and lower leakage. Atomic force microscope images showed that the thinner
film had half-domed-shaped grains, which were about one-third thinner at th
e grain boundary triple points. These triple points also contained a nanocr
ystalline nonstoichiometric secondary phase, which contributed to high leak
age. A model was developed showing differences in crystallization on the ba
sis of gain growth and number of nuclei on the Pt surface. These results in
dicate the importance of controlling the film microstructure and its relati
onship to the film electrical properties.