Ga. Hebner et al., Influence of surface material on the boron chloride density in inductivelycoupled discharges, J VAC SCI A, 17(6), 1999, pp. 3218-3224
The relative density of BCl radicals has been measured in a modified Applie
d Materials decoupled plasma source commercial metal etch chamber using las
er-induced fluorescence. In plasmas containing mixtures of BCl3 with Cl-2,
Ar, and/or N-2, the relative BCl density was measured as a function of sour
ce and bias power, pressure, flow rate, BCl3/Cl-2 ratio, and argon addition
. To determine the influence of surface materials on the bulk plasma proper
ties, the relative BCl density was measured using four different substrate
types; aluminum, alumina, photoresist, and photoresist-patterned aluminum.
In most cases, the relative BCl density was highest above photoresist-coate
d wafers and lowest above blanket aluminum wafers. The BCl density increase
d with increasing source power and the ratio of BCl3 to Cl-2, while the add
ition of N-2 to a BCl3/Cl-2, plasma resulted in a decrease in BCl density.
The BCl density was relatively insensitive to changes in the other plasma p
arameters. (C) 1999 American Vacuum Society. [S0734-2101(99)04806-X].