CN films were made by a facing target sputtering system. X-ray diffraction,
x-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy
and Raman spectroscopy spectra were measured to investigate the structure a
nd the binding state of the film. The films an amorphous and the N/C increa
ses as the N-2 partial pressure increases and it reaches 0.46 when the N-2?
pressure is 100%. The N incorporated C forms N-sp(2) C and N-sp(3) C mainl
y and there is a small amount of C drop N. The incorporated N causes struct
ural disorder of the C films and a reduction in the friction coefficient of
the films. (C) 1999 American Vacuum Society. [S0734-2101(99)01206-3].