Tau-Charm factory vacuum chamber design

Citation
V. Antropov et al., Tau-Charm factory vacuum chamber design, J VAC SCI A, 17(6), 1999, pp. 3486-3494
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
17
Issue
6
Year of publication
1999
Pages
3486 - 3494
Database
ISI
SICI code
0734-2101(199911/12)17:6<3486:TFVCD>2.0.ZU;2-9
Abstract
The present article gives a description of the vacuum chamber required for a high luminosity electron e(+)-e(-) collider Tau-Charm factory. The beam l ifetime, which is limited by the single particle collisions with molecules of the residual gas, is estimated. The synchrotron radiation gas loading is studied for the Tau-Charm factory vacuum chamber. The effect of various cl eaning procedures on the outgassing behavior of samples of the chamber wall is studied. It is shown that a cleaning procedure by a suitable NaOH etchi ng gives the best results of the tested techniques for minimizing of contam inations and outgassing rates. (C) 1999 American Vacuum Society. [S0734-210 1(99)03506-X].