Rapid thermal processing of TiN coatings deposited by chemical and physical vapor deposition using a low-energy, high-current electron beam: Microstructural studies and properties

Citation
Aj. Perry et al., Rapid thermal processing of TiN coatings deposited by chemical and physical vapor deposition using a low-energy, high-current electron beam: Microstructural studies and properties, MET MAT T A, 30(11), 1999, pp. 2931-2939
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science",Metallurgy
Journal title
METALLURGICAL AND MATERIALS TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE
ISSN journal
10735623 → ACNP
Volume
30
Issue
11
Year of publication
1999
Pages
2931 - 2939
Database
ISI
SICI code
1073-5623(199911)30:11<2931:RTPOTC>2.0.ZU;2-4
Abstract
Monolithic TiN coatings deposited onto cemented carbide cutting tool insert s coated by chemical vapor deposition (CVD) or physical vapor deposition (P VD) methods, respectively were subjected to pulsed intense electron beam tr eatments in the energy range 3 to 5 J.cm(-2). The temperature profiles for this rapid thermal processing (RTP) covered the range between fusion of the cobalt binder in the carbide to surface fusion of the TiN coatings. The tr eatment caused extensive cracking in all coatings, removed the atomic level defects, vacancies and dislocations, and the residual stress in the PVD co atings, but caused little change in the CVD coatings. There was some nitrog en loss very close to the surface but no change in the stoichiometry of the bulk of the nitride. In contrast, no changes were found in the carbide sub strate below the PVD coatings, but microscopic changes were found immediate ly below the surface in the carbide under the CVD coatings. Steel turning t ests suggest that treatment of the PVD coatings at the lowest power used, 3 J.cm(-2), reduced the flank wear by a factor of 2 but had no effect on any of the CVD coatings.