Scanning ion deep level transient spectroscopy

Citation
Js. Laird et al., Scanning ion deep level transient spectroscopy, NUCL INST B, 158(1-4), 1999, pp. 464-469
Citations number
11
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN journal
0168583X → ACNP
Volume
158
Issue
1-4
Year of publication
1999
Pages
464 - 469
Database
ISI
SICI code
0168-583X(199909)158:1-4<464:SIDLTS>2.0.ZU;2-A
Abstract
We describe a new spectroscopic technique on the MeV ion microprobe, which allows the mapping of electrically active defects within a semiconductor. T he technique known here as Scanning Ion Deep Level Transient Spectroscopy ( SIDLTS) is analogous to the bulk technique Deep Level Transient Spectroscop y (DLTS). In SIDLTS, the electron-hole (e-h) plasma induced by the MeV ion provides the trap-filling pulse. A simple theoretical framework for sensiti vity is discussed as is the system developed to achieve it. A comparison of DLTS and SIDLTS on an implanted An-Si Schottky barrier is made, including quantitative estimations of the trap activation energies and sensitivity. ( C) 1999 Published by Elsevier Science B.V. All rights reserved.