We describe a new spectroscopic technique on the MeV ion microprobe, which
allows the mapping of electrically active defects within a semiconductor. T
he technique known here as Scanning Ion Deep Level Transient Spectroscopy (
SIDLTS) is analogous to the bulk technique Deep Level Transient Spectroscop
y (DLTS). In SIDLTS, the electron-hole (e-h) plasma induced by the MeV ion
provides the trap-filling pulse. A simple theoretical framework for sensiti
vity is discussed as is the system developed to achieve it. A comparison of
DLTS and SIDLTS on an implanted An-Si Schottky barrier is made, including
quantitative estimations of the trap activation energies and sensitivity. (
C) 1999 Published by Elsevier Science B.V. All rights reserved.