Deposition of potential energy in solids by slow, highly charged ions

Authors
Schenkel, T Barnes, AV Niedermayr, TR Hattass, M Newman, MW Machicoane, GA McDonald, JW Hamza, AV Schneider, DH
Citation
T. Schenkel et al., Deposition of potential energy in solids by slow, highly charged ions, PHYS REV L, 83(21), 1999, pp. 4273-4276
Citations number
32
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
83
Issue
21
Year of publication
1999
Pages
4273 - 4276
Database
ISI
SICI code
0031-9007(19991122)83:21<4273:DOPEIS>2.0.ZU;2-U
Abstract
We have measured the deposition of potential energy of slow (similar to 6 x 10(5) m/s), highly charged ions in solids with an ion implanted silicon de tector. A large fraction (about 35% or 60 keV) of the potential energy diss ipated by Au69+ ions can be traced in electronic excitations deep (>50 nm) inside the solid. In contrast, only about 10% of the potential energy has b een accounted for in measurements of emitted secondary particles.