EFFECTS OF THE MICROSTRUCTURE ON THE PERFORMANCE OF MICROSTRIP LINE RESONATOR MADE OF MOCVD YBA2CU3OX FILM

Citation
Ch. Cho et al., EFFECTS OF THE MICROSTRUCTURE ON THE PERFORMANCE OF MICROSTRIP LINE RESONATOR MADE OF MOCVD YBA2CU3OX FILM, Physica. C, Superconductivity, 229(1-2), 1994, pp. 129-136
Citations number
10
Categorie Soggetti
Physics, Applied
ISSN journal
09214534
Volume
229
Issue
1-2
Year of publication
1994
Pages
129 - 136
Database
ISI
SICI code
0921-4534(1994)229:1-2<129:EOTMOT>2.0.ZU;2-J
Abstract
Microstrip transmission lines in the form of an open-ended half wavele ngth resonator were fabricated on YBa2Cu3Ox thin films deposited on Mg O and LaAlO3 substrates using MOCVD. The effects of the microstructure on the performance of the resonator were investigated. C-axis normal YBa2Cu3Ox thin films deposited on LaAlO3 substrate showed a higher qua lity factor and a lower surface resistance than that on MgO. The c-axi s normal film showed a lower surface resistance than a,b-axis normal f ilms. The lowest surface resistance of 22 mOMEGA was obtained for the c-axis normal film on LaAlO3 Substrate in this study.