Jd. Chung et M. Kaviany, Effects of phonon pore scattering and pore randomness on effective conductivity of porous silicon, INT J HEAT, 43(4), 2000, pp. 521-538
The observed low effective thermal conductivity of porous silicon makes for
its convenient fabrication and integration as a thermal insulation layer i
n microelectronics. The observed average pore size is controlled by the etc
hing process and ranges between 1 and 100 nm, which on the low end is much
less than the bulk phonon mean-free path. This low effective conductivity,
i.e., low effective phonon mean-free path, can be explained with the inclus
ion of the effects of the phonon pore scattering and the pore randomness. T
he available two-dimensional porous silicon pore-network simulations are us
ed along with the Boltzmann transport equation to determine the effective c
onductivity. It is shown that the hindering effect of the phonon pore scatt
ering (due to reflection from the solid-pore interface) is significant for
small pore size. Also, due to the dendritic structure of the pores, the hin
dering effect of the pore-network randomness is significant. The prediction
s are compared with the existing experiments and a good agreement is found.
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