The possibilities of using thin layers of As2S3 and AgI as ion sensitive me
mbranes for ion selective field-effect transistors (ISFETs) are investigate
d. The thin films have been prepared by vacuum deposition on static and rot
ating substrates. The As2S3 layers were additionally doped with silver. The
influence of the type of substrates and preparation conditions on electroc
hemical properties of the layers was studied. Electrochemical measurements
revealed a reasonable sensitivity of chalcogenide and halide layers to silv
er and iodide ions, respectively. The near Nernstian behavior of sensitivit
y of As2S3 layers to Ag+ ions and of AgI layers to I- ions is observed. The
results obtained are promising for the development of ISFETs. (C) 1999 Els
evier Science B.V. All rights reserved.