Growth of V2O5 thin films by pulsed laser deposition and their applications in lithium microbatteries

Citation
C. Julien et al., Growth of V2O5 thin films by pulsed laser deposition and their applications in lithium microbatteries, MAT SCI E B, 65(3), 1999, pp. 170-176
Citations number
27
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
65
Issue
3
Year of publication
1999
Pages
170 - 176
Database
ISI
SICI code
0921-5107(19991130)65:3<170:GOVTFB>2.0.ZU;2-7
Abstract
Vanadium pentoxide thin films were obtained by pulsed-laser deposition onto various substrates. The growth was performed at different oxygen pressures and substrate temperatures. It is found that the films deposited on glass are amorphous and exhibit a polycrystalline structure upon thermal treatmen t as evidenced by X-ray diffraction and Raman scattering spectroscopy. The films deposited onto silicon wafer have an excellent crystallinity when dep osited at substrate temperatures of 300 degrees C and an oxygen pressure of 50 mTorr. V2O5 thin films obtained by this method were successfully used a s a cathode materials in lithium microbatteries. Electrochemical measuremen ts show a good cyclability of pulsed laser deposited films. (C) 1999 Elsevi er Science S.A. All rights reserved.