HF plasma pencil - new source for plasma surface processing

The high-frequency plasma pencil is a source of a highly active environment (electrons, ions, reactive radicals, excited atoms and molecules), which c an be generated at atmospheric, reduced or increased pressure, preserving a broad control of performance. As an active medium flowing through the plas ma jet a gas, a liquid as well as a mixture of dispersed particles (powders ) can be used. The plasma jet can be controlled like hand-operated tools. S everal technological applications have already been used (restoration of ar cheological glass artifacts, fullerene production, fragmentation of molecul es for microelectrophoresis, plasma polymerization in liquids, various plas ma surface treatments, etc.). (C) 1999 Elsevier Science S.A. All rights res erved.