The influence of process parameters on the mechanical properties of magnetr
on-sputtered Ti-C:H films was investigated using fractional factorial exper
imental design. The parameters studied included substrate bias voltage, ace
tylene flow rate, and argon and nitrogen partial pressures. The results ind
icated that bias voltages in the range -20 to -60 V had little or no influe
nce on the mechanical properties. The acetylene flow rate, which controlled
the titanium content in the Ti-C:H layers, exhibited the most significant
effect. An explanation based on the relationship between relative film thic
kness and critical applied loads is provided for the coating failure mechan
isms. (C) 1999 Elsevier Science S.A. FLU lights reserved.