The energy dependence on microstructure of (Ti-Al-V) nitrides deposited bydual ion beam sputtering

Ti-6Al-4V alloys and their nitrides are of wide interest in technological a pplications because of their exceptional properties. The structure and comp osition of these alloys are strongly dependent on the deposition conditions . In this work? we report the influence of the ion energy on the film chara cteristics. We have used a dual ion beam sputtering (DIBS) equipment where the reactive ion (N-2) acceleration voltage was changed in the range of 200 to 400 V. The film structure was studied by means of an X-ray diffractomet er (XRD) and the chemical composition and nitration degree were measured by X-ray photoelectron spectroscopy(XPS) and by a microprobe spectrometer. Co ating hardness was checked using an ultramicrohardness tester equipped with a Vickers' indentor, and the corrosion resistance power was studied by mea ns of cyclic voltammetry. The substrates used here were stainless steel ISO 316, the same used in most femoral prosthesis, and silicon monocrystals fo r the analytical tests. We compare the results of the coatings deposited by DIBS with films deposited by reactive magnetron sputtering. (C) 1999 Elsev ier Science S.A. All rights reserved.