Inhomogeneous deposition of TiN by pulsed PACVD caused by a plasma dynamiceffect

Citation
Ta. Beer et al., Inhomogeneous deposition of TiN by pulsed PACVD caused by a plasma dynamiceffect, SURF COAT, 119, 1999, pp. 1016-1023
Citations number
7
Categorie Soggetti
Material Science & Engineering
Journal title
SURFACE & COATINGS TECHNOLOGY
ISSN journal
02578972 → ACNP
Volume
119
Year of publication
1999
Pages
1016 - 1023
Database
ISI
SICI code
0257-8972(199909)119:<1016:IDOTBP>2.0.ZU;2-R
Abstract
In the present work. we investigate the time development of pulsed d.c. pla smas relevant for the production of TiN coatings by PACVD. A videocamera wi th gateable image-intensifier is used for studying the spatial and temporal evolution of the light intensity of the plasma. Additionally, we use a sin gle electrostatic probe to determine a time-resolved charged particle distr ibution of the plasma during the pulses and afterglow. In the presence of e lectronegative species like TiCl4 the ignition of the plasma in each pulse is slow, reaching some parts of the cathode surface only after substantial delays. This phenomenon is most likely responsible for the inhomogeneous di stribution of quality and thickness of the coatings. Langmuir-probe measure ments demonstrate the conversion of electrons into negative ions during the time interval between the pulses. (C) 1999 Elsevier Science S.A. All right s reserved.