Automatic Langmuir probe measurement in a magnetron sputtering system

Citation
M. Spolaore et al., Automatic Langmuir probe measurement in a magnetron sputtering system, SURF COAT, 119, 1999, pp. 1083-1088
Citations number
10
Categorie Soggetti
Material Science & Engineering
Journal title
SURFACE & COATINGS TECHNOLOGY
ISSN journal
02578972 → ACNP
Volume
119
Year of publication
1999
Pages
1083 - 1088
Database
ISI
SICI code
0257-8972(199909)119:<1083:ALPMIA>2.0.ZU;2-E
Abstract
The electron temperature, ion density, plasma potential and magnetic field are measured in a plasma produced by a magnetron sputtering device. The mag netic field has been mapped by measuring the axial and radial components wi th Hall probes. The plasma parameters have been measured by a diagnostic sy stem consisting of several Langmuir probes with different collecting areas that can be positioned by a linear translator. The automatic analysis syste m allows one to take into account non-saturation of the ion current due to sheath thickness variation. The Langmuir probes have been used in various c onditions of magnetic field and source power with a gas filling pressure of 1 Pa. It has been found that the diagnostic system gives reliable measurem ents of the plasma parameters in static and inhomogeneous magnetic fields. (C) 1999 Elsevier Science S.A. All rights reserved.