Spatially resolved measurements of plasma parameters is a broad-beam ion source

Citation
D. Flamm et M. Zeuner, Spatially resolved measurements of plasma parameters is a broad-beam ion source, SURF COAT, 119, 1999, pp. 1089-1092
Citations number
14
Categorie Soggetti
Material Science & Engineering
Journal title
SURFACE & COATINGS TECHNOLOGY
ISSN journal
02578972 → ACNP
Volume
119
Year of publication
1999
Pages
1089 - 1092
Database
ISI
SICI code
0257-8972(199909)119:<1089:SRMOPP>2.0.ZU;2-S
Abstract
We measured spatially resolved plasma parameters inside the discharge chamb er of a broad-beam ion source using the Langmuir-probe technique. Radial pr ofiles of non-uniform charge-carrier densities between 10(10) and 10(11) cm (-3) are detected which depend on discharge current and voltage. The plasma potential is determined as being equal to the anode potential. Two maxima characterize the electron-energy distribution, a low-energy one produced by thermalized electrons and a second maximum of primary electrons accelerate d in the filament sheath. The strength of the multipole magnetic field of t he ion source strongly affects the spatial charge-carrier distribution. At a small magnetic-field strength the radial carrier-density distribution is more uniform than at a strong one. These different radial charge-carrier de nsities in the discharge chamber are also reflected in the extracted ion-be am profiles and ion-beam currents. (C) 1999 Elsevier Science S.A. All right s reserved.