Broad optical bandwidth InGaAs-InA1GaAs light-emitting diodes fabricated using a laser annealing process

Citation
Sd. Mcdougall et al., Broad optical bandwidth InGaAs-InA1GaAs light-emitting diodes fabricated using a laser annealing process, IEEE PHOTON, 11(12), 1999, pp. 1557-1559
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE PHOTONICS TECHNOLOGY LETTERS
ISSN journal
10411135 → ACNP
Volume
11
Issue
12
Year of publication
1999
Pages
1557 - 1559
Database
ISI
SICI code
1041-1135(199912)11:12<1557:BOBILD>2.0.ZU;2-D
Abstract
The use of a laser-induced quantum-well intermixing technique in the InGaAs -InAlGaAs material system is presented. We report blue shifts of up to 240 nm in the 1.55-mu m emission wavelength, generated by exposure to a Nd:YAG laser. Variations in the optical intensity across the irradiating beam were used to laterally grade the bandgap along a sample. We used this technique to fabricate broad optical bandwidth, light-emitting diodes. The devices s howed an increase in the full width half maximum of the emission spectrum f rom 125 nm in undisordered devices to over 260 mm in intermixed material. T he output spectrum was also observed to be flat-topped (within 5%) across a wavelength range of 140 nm.