Resonant-cavity-enhanced high-speed Si photodiode grown by epitaxial lateral overgrowth

Citation
Jd. Schaub et al., Resonant-cavity-enhanced high-speed Si photodiode grown by epitaxial lateral overgrowth, IEEE PHOTON, 11(12), 1999, pp. 1647-1649
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE PHOTONICS TECHNOLOGY LETTERS
ISSN journal
10411135 → ACNP
Volume
11
Issue
12
Year of publication
1999
Pages
1647 - 1649
Database
ISI
SICI code
1041-1135(199912)11:12<1647:RHSPGB>2.0.ZU;2-U
Abstract
We report a resonant cavity Si photodiode grown by merged epitaxial lateral overgrowth. At a reverse bias of 5 V, the dark current was 2.7 pA and the bandwidth exceeded 34 GHz, The peak quantum efficiencies ranged from 42% at 704 nm to 31% at 836 nm. This is the highest speed reported for a Si p-i-n photodiode and the highest bandwidth-efficiency product for any Si-based p hotodetector.