Effects of operating conditions on etch rate and factor of 42 alloy with afine-slit resist pattern

Spray etching characteristics of 42 Alloy with a fine-slit resist pattern w ere investigated by changing the width of photo-resist aperture, etchant te mperatures (similar to 90 degrees C) and spraying pressures (similar to 6 a tm). Both the etch rate and factor decreased with decreasing the width of p hoto-resist aperture. High etchant temperatures gave high etch rates. Howev er, high etchant temperatures were not always effective in etch factor. Act ivation energies were 28.4 kJ/mol and 31.2 kJ/mol when slit patterns were p arallel to and perpendicular to the rolling direction of 42 Alloy, respecti vely. High spraying pressures improved both the etch rate and factor by the strong blow of etchant droplets. By increasing both the etchant concentrat ion and the spraying pressure, high accuracy and high efficiency were achie ved even for the high temperature etching processes.