Low-frequency light scattering in silica xerogels: influence of the heat treatment

Authors
Terki, F Pilliez, JN Woignier, T Pelous, J Fontana, A Rossi, F Montagna, M Ferrari, M Cicognani, G Dianoux, AJ
Citation
F. Terki et al., Low-frequency light scattering in silica xerogels: influence of the heat treatment, PHIL MAG B, 79(11-12), 1999, pp. 2081-2089
Citations number
30
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICSELECTRONIC OPTICAL AND MAGNETIC PROPERTIES
ISSN journal
13642812 → ACNP
Volume
79
Issue
11-12
Year of publication
1999
Pages
2081 - 2089
Database
ISI
SICI code
1364-2812(199911/12)79:11-12<2081:LLSISX>2.0.ZU;2-
Abstract
Brillouin and Raman measurements have been performed on silica xerogels in a wide range of densities (from 0.5 to 2.2 g cm(-3)) and temperatures (from 6 to 750 K). The experimental results show that water dynamics gives stron g low-frequency Raman scattering and influences the Brillouin shift and att enuation.