GaN substrates: Growth and characterization

Citation
O. Kryliouk et al., GaN substrates: Growth and characterization, PHYS ST S-A, 176(1), 1999, pp. 407-410
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH
ISSN journal
00318965 → ACNP
Volume
176
Issue
1
Year of publication
1999
Pages
407 - 410
Database
ISI
SICI code
0031-8965(19991116)176:1<407:GSGAC>2.0.ZU;2-9
Abstract
Single crystal GaN substrates were grown by Hydride-Metal Organic Vapor Pha se Epitaxy (H-MOVPE) on nearly lattice matched LiGaO2 substrates. The key t o obtain high quality GaN films on LiGaO2 was the initial surface nitridati on step. A self-separating technique was developed that leaves tree-standin g flat single crystal GaN without using mechanical or chemical removal of t he underlying substrate. It was determined that the surface nitridation and cooling processes were critical in film-substrate self-separation.