X-ray photoelectron spectroscopic investigation of the GaAs nitridation mechanism with an ECR plasma source

Citation
M. Sauvage-simkin et al., X-ray photoelectron spectroscopic investigation of the GaAs nitridation mechanism with an ECR plasma source, PHYS ST S-A, 176(1), 1999, pp. 671-676
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH
ISSN journal
00318965 → ACNP
Volume
176
Issue
1
Year of publication
1999
Pages
671 - 676
Database
ISI
SICI code
0031-8965(19991116)176:1<671:XPSIOT>2.0.ZU;2-Q
Abstract
The mechanism of arsenic replacement by nitrogen to produce beta-GaN in GaA s(001) samples exposed to the flux of an electron cyclotron resonance (ECR) plasma source is discussed on the basis of core level photoemission and ph otodiffraction data collected in situ. An amorphisation step is clearly evi denced which could favour nitrogen incorporation but should be kept at a mi nimum in order to maintain a cubic crystallographic template to stabilize-t he Ga-N bonds into epitaxial beta-GaN.