Intrinsic Josephson effects in submicrometre Bi2212 mesas fabricated by using focused ion beam etching

Authors
Winkler, D Mros, N Tarte, EJ Yurgens, A Krasnov, VM Foord, DT Booij, WE Blamire, MG
Citation
D. Winkler et al., Intrinsic Josephson effects in submicrometre Bi2212 mesas fabricated by using focused ion beam etching, SUPERCOND S, 12(11), 1999, pp. 1013-1015
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SUPERCONDUCTOR SCIENCE & TECHNOLOGY
ISSN journal
09532048 → ACNP
Volume
12
Issue
11
Year of publication
1999
Pages
1013 - 1015
Database
ISI
SICI code
0953-2048(199911)12:11<1013:IJEISB>2.0.ZU;2-2
Abstract
We have investigated the current-voltage (I-V) characteristics of sub-mu m sized mesas made the surface of Bi2Sr2CaCu2O8 (Bi2212) single crystals. The mesas were fabricated using focused ion beam etching. The samples showed e xcellent I-V characteristics and their conductance-voltage (G-V) curves wer e measured from above the transition temperature down to 4.2 K. New ways of making annular mesas with diameters down to 0.5 mu m were also investigate d.