Properties of tungsten and vanadium oxides deposited by MSIP-PVD process for self-lubricating applications

Citation
E. Lugscheider et al., Properties of tungsten and vanadium oxides deposited by MSIP-PVD process for self-lubricating applications, SURF COAT, 121, 1999, pp. 458-464
Citations number
13
Categorie Soggetti
Material Science & Engineering
Journal title
SURFACE & COATINGS TECHNOLOGY
ISSN journal
02578972 → ACNP
Volume
121
Year of publication
1999
Pages
458 - 464
Database
ISI
SICI code
0257-8972(199911)121:<458:POTAVO>2.0.ZU;2-K
Abstract
The tungsten and vanadium oxides are known to be usable as solid lubricants at elevated temperatures. So far they have been used mainly as powdery mat erials for tribological applications or as a component of ceramics. Metal o xides are interesting for tribological insets at atmospheric conditions bec ause of their oxidation stability. This study reports on investigations to find stable process windows for the deposition of tungsten and vanadium oxi des in a reactive and non-reactive mode by the magnetron sputter ion platin g-PVD-process. One focus of the study is the metal oxide phases generated i n the MSIP-process under various conditions and their mechanical and metall ographic properties. Coatings were deposited and analyzed by various testin g methods to characterize the mechanical and structural properties, such as SEM, scratch-testing, Rockwell test, nanoindentation and XRD. Stable proce ss windows will be presented for the reactive mode as well as the influence of different process parameters to phase generation, microstructure and th e material properties. The influence of process-parameters on the depositio n rate (d.c. versus r.f mode, reactive versus non-reactive mode) is of grea t interest to evaluate the economic relevance. It will be shown that it is possible to deposit vanadium and tungsten oxides despite target contaminati on effects in wide ranges by adapting the reactive gas-flow, the total gas pressure and the target power. (C) 1999 Elsevier Science S.A. All rights re served.