Rod cathode arc-activated deposition (RAD) - a new plasma-activated electron beam PVD process

The paper presents a new plasma-activated PVD process - the so-called rod c athode are-activated deposition (RAD) process. This process has been engine ered for high rate electron beam evaporation in the power range of 30-300 k W and is well matched to large area deposition. The plasma is generated by an are discharge embedded in the vapour stream of evaporated material. An a dditional rod-shaped hot electrode is used as the cathode of the are discha rge. The electrode is heated by a certain part of the beam power. The RAD p rocess is demonstrated by means of the plasma-activated deposition of stain less steel coatings. A high deposition rate of the order of 0.1-2 mu m s(-1 ) and an intense ion bombardment at an ion current density of 10-150 mA cm( -2) have been measured on the substrate. Some relations between microstruct ure of the layers, layer properties and process parameters are shown. Final ly, an outlook about potential applications of this technology is presented . (C) 1999 Elsevier Science S.A. All rights reserved.