High-resolution submicron retarding field energy analyzer for low-temperature plasma analysis

Citation
Mg. Blain et al., High-resolution submicron retarding field energy analyzer for low-temperature plasma analysis, APPL PHYS L, 75(25), 1999, pp. 3923-3925
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
25
Year of publication
1999
Pages
3923 - 3925
Database
ISI
SICI code
0003-6951(199912)75:25<3923:HSRFEA>2.0.ZU;2-N
Abstract
A retarding potential energy analyzer having 750 nm diameter, self-aligned grid apertures and micron scale grid separation has been fabricated using p olycrystalline silicon and silicon dioxide. High-resolution in situ measure ments of ion velocity distributions have been demonstrated in inductively c oupled argon plasmas. Measurement results agree well with those from a macr oscopic analyzer. Important differences are observed in the energies of pla sma ions when measured with respect to chamber wall versus those measured w ith respect to the plasma floating potential. Preliminary measurements unde r rf bias conditions have also been made and results follow the expected tr ends. (C) 1999 American Institute of Physics. [S0003-6951(99)00451-9].