Mg. Blain et al., High-resolution submicron retarding field energy analyzer for low-temperature plasma analysis, APPL PHYS L, 75(25), 1999, pp. 3923-3925
A retarding potential energy analyzer having 750 nm diameter, self-aligned
grid apertures and micron scale grid separation has been fabricated using p
olycrystalline silicon and silicon dioxide. High-resolution in situ measure
ments of ion velocity distributions have been demonstrated in inductively c
oupled argon plasmas. Measurement results agree well with those from a macr
oscopic analyzer. Important differences are observed in the energies of pla
sma ions when measured with respect to chamber wall versus those measured w
ith respect to the plasma floating potential. Preliminary measurements unde
r rf bias conditions have also been made and results follow the expected tr
ends. (C) 1999 American Institute of Physics. [S0003-6951(99)00451-9].