Localized states at InGaN/GaN quantum well interfaces

Citation
Lj. Brillson et al., Localized states at InGaN/GaN quantum well interfaces, APPL PHYS L, 75(24), 1999, pp. 3835-3837
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
75
Issue
24
Year of publication
1999
Pages
3835 - 3837
Database
ISI
SICI code
0003-6951(199912)75:24<3835:LSAIQW>2.0.ZU;2-M
Abstract
Low-energy electron-excited nanoscale-luminescence (LEEN) spectroscopy of G aN/InGaN/GaN double-heterojunction structures reveal the formation of elect ronic states localized near the quantum well interfaces under relatively In -rich conditions. These states are due to formation in a cubic GaN region c omparable to the quantum well layer in thickness rather than the bulk nativ e defects typically associated with growth quality. The nanoscale depth dep endence of the noncontact, nondestructive LEEN technique enables detection of this competitive recombination channel within a few nanometers of the "b uried" heterojunction interfaces. (C) 1999 American Institute of Physics. [ S0003-6951(99)01250-4].