Process development for low temperature CO oxidation in the presence of water and halogen compounds

Citation
Js. Lee et al., Process development for low temperature CO oxidation in the presence of water and halogen compounds, CATAL TODAY, 54(1), 1999, pp. 57-64
Citations number
16
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
CATALYSIS TODAY
ISSN journal
09205861 → ACNP
Volume
54
Issue
1
Year of publication
1999
Pages
57 - 64
Database
ISI
SICI code
0920-5861(19991126)54:1<57:PDFLTC>2.0.ZU;2-U
Abstract
A new process has been developed to oxidize CO at low temperatures (<423 K) in vent streams that also contain halogenated compounds and water, A PdCl2 -CuCl2 catalyst supported on carbon was successfully implemented to treat t he oxidation reactor vent stream of a terephthalic acid plant that containe d water, CH3Br and other organic compounds in addition to CO. The CH3Br rem ained intact during the treatment and did not deactivate the catalyst. In t his catalyst system, palladium remained as a molecular Pd(II) species while solid Cu2Cl(OH)(3) was the active copper phase. The formation of stable Cu 2Cl(OH)(3) was essential for activity and stability of the catalyst, After obtaining a stable catalytic activity for six months in a pilot plant test with a side stream of real vent gases, the first installation and operation of the process were made successfully to handle 50,000 Nm(3)/h of vent str eam in a terephthalic acid plant. (C) 1999 Elsevier Science B.V. All rights reserved.