Pb deposition on n-Si(111) electrodes

Citation
Jc. Ziegler et al., Pb deposition on n-Si(111) electrodes, ELECTR ACT, 45(4-5), 1999, pp. 827-833
Citations number
29
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ELECTROCHIMICA ACTA
ISSN journal
00134686 → ACNP
Volume
45
Issue
4-5
Year of publication
1999
Pages
827 - 833
Database
ISI
SICI code
0013-4686(1999)45:4-5<827:PDONE>2.0.ZU;2-C
Abstract
The electrodeposition of Pb on H-terminated n-Si(111) electrodes from 0.1 M HClO4 + 0.1 mM Pb(ClO4)(2) has been studied by electrochemical techniques and AFM, Pb deposition on such a surface has been found to be reversible an d current transient measurements have indicated that the deposition process starts via instantaneous nucleation. From AFM measurements in air it has b een concluded that Pb grows in a Volmer-Weber growth mode with apparently n o preferential nucleation sites on the substrate. (C) 1999 Elsevier Science Ltd. All rights reserved.