Pb deposition on n-Si(111) electrodes

The electrodeposition of Pb on H-terminated n-Si(111) electrodes from 0.1 M HClO4 + 0.1 mM Pb(ClO4)(2) has been studied by electrochemical techniques and AFM, Pb deposition on such a surface has been found to be reversible an d current transient measurements have indicated that the deposition process starts via instantaneous nucleation. From AFM measurements in air it has b een concluded that Pb grows in a Volmer-Weber growth mode with apparently n o preferential nucleation sites on the substrate. (C) 1999 Elsevier Science Ltd. All rights reserved.