The deposition and structure of nanophase gold films on the surface of quar
tz were studied in detail on the basis of earlier developed theoretical and
experimental approaches. The effects of the initial concentration of the g
old(III) complex, the nature and composition of the solvent, and the wavele
ngth and intensity of UV irradiation were examined. The results demonstrate
that, by varying process conditions, one can control the deposition rate a
nd properties of the resulting nanophase films.